Used TEL / TOKYO ELECTRON Mark 8 #9098398 for sale

TEL / TOKYO ELECTRON Mark 8 Photoresist Equipment is a highly advanced and advanced system for maskless lithography applications. It uses a novel concept of using a two-dimensional light-emitting diode (LED) array as the main illumination source and optical lenses to accurately focus the LED illumination. It is capable of processing feature sizes ranging from a few microns to several millimeters and can easily achieve nanometer registration accuracy. It is also capable of working with a variety of photoresist materials, including optical and electron beam resists, as well as dry etch and metallization. The unit is composed of several components, including an optical head assembly that contains a light source and lens cavity, a LED collimating module, a digital image projection module, and an alignment machine for accurately positioning the optics and the imaging substrate onto the tool. The LED array provides the illumination necessary for patterning patterns into a resist material and is able to deliver an unprecedented level of linearity in light intensity with a wide range of operating wavelengths. The LED collimation module features an electronically-actuated valve, which allows precise switching between direct illumination and diffused light, enabling finer feature coverage and exposure latitude. With the use of a special sensor and imaging software, it is possible to accurately align the LED array and substrate for alignment accuracy above one nanometer. The digital image projection module is used to control the image intensity, through a number of settings, such as pulse width modulation as well as the spatial resolution of the image. This module can also be used to enlarge or reduce the imaging area, while preserving the overall quality of the image. The asset also features an alignment model for accurately aligning the imaging substrate and LED array, allowing for high precision alignment with feature registration accuracy of up to one nanometer. The alignment equipment also utilizes a variety of probes and detectors for measuring the position of the imaging substrate and LED array in x-y-z direction and is able to accurately characterize the resist pattern distortion. Overall, TEL MARK8 is a highly advanced system for maskless lithography applications that features a unique array-LED collimation unit and digital image projection module for greater feature density and edge control, with extremely high exposure accuracy of up to one nanometer. It is perfect for nanotechnology applications requiring high levels of accuracy and precision in the creation of exact patterns and structures.