Used TEL / TOKYO ELECTRON Mark 8 #9098402 for sale

TEL / TOKYO ELECTRON Mark 8
ID: 9098402
Wafer Size: 8"
Vintage: 1995
(1) Coater / (2) Developers System, 8", 1995 vintage.
TEL / TOKYO ELECTRON Mark 8 is a photoresist equipment designed for photolithography, commonly used for microcircuit fabrication. It can be used for the creation of abstract patterns onto flat surfaces and is often used for advanced or complex integrated circuit designs. TEL MARK8 consists of three parts: the wafer stage, the lamp and the photoresist. The wafer stage is the system's base, upon which the wafer with the desired integrated circuit design is placed. The design is first tested on a flat-panel display and then transferred onto the wafer. The stage is designed to hold and move the wafer automatically. The lamp is the source of UV light and generates a focused beam that passes through an optical lens onto the wafer. The lamp is able to produce a wide range of wavelengths, allowing it to handle multiple photoresists. A photoresist is a material that, when exposed to the UV light, creates an image or creates a pattern or design onto the wafer surface. The photoresist is applied to the wafer's surface and, after exposure to the lamp's UV light, either binds to the surface or is washed away, resulting in the desired pattern. In addition to the individual components, TOKYO ELECTRON MARK-8 includes additional functions, such as an adjustable nozzle size, a three-stage pump process, an empirically based automated calibration unit and a cooling water base. The nozzle size is adjustable up to 6.4 mm, allowing for greater detail in patterning. The three-stage pump process provides a more efficient and uniform delivery of the photoresist. The automated calibration is designed to ensure the highest level of accuracy and repeatability of MARK-8 machine. Finally, the cooling water base adds additional cooling to reduce potential overheating. Combined, these features make Mark 8 an ideal tool for photolithography and microcircuit fabrication applications. Its ability to quickly and accurately produce patterns on a wafer surface allows it to be used in a variety of industries, such as aerospace and consumer electronics, as well as in the creation of integrated circuits in advanced electronics applications.
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