Used TEL / TOKYO ELECTRON Mark 8 #9098639 for sale

TEL / TOKYO ELECTRON Mark 8
ID: 9098639
Wafer Size: 8"
Vintage: 1996
(1) Coater / (2) Developers System, 8", 1996 vintage.
TEL / TOKYO ELECTRON Mark 8 Photoresist Equipment is a state-of-the-art photoresist system designed for the most advanced lithography applications. The unit utilizes a lightweight, self-contained, robotic arm that automates the photo-processing steps associated with photolithography. This machine enables precise, high-precision, and high-throughput production of complex lithographic patterns. TEL MARK8 Photoresist Tool features a powerful asset of integrated hardware and software. This model's main components include a digital imaging equipment, a fine-control system, a resist development unit, and a post-exposure baking oven. The digital imaging machine includes a laser interferometer, a digital imaging camera, and a laser illumination tool. This asset allows for precise control over the placement and alignment of patterns with resolutions up to 0.1 micron. The fine-control model allows for precision adjustment of the photomask and photoresist exposure dose. The resist development equipment is used to develop and etch patterns on the substrate. This system utilizes standard resist development processes such as alkaline, acid, and heat. Finally, the post-exposure baking oven is used to complete the photoresist development process. This oven brings the photoresist to the appropriate temperature for development. TOKYO ELECTRON MARK-8 Photoresist Unit is an advanced, high-performance machine that ensures precision, accuracy, and repeatability in the manufacturing of photoetched parts for the most demanding applications. The tool is designed to enable fast throughput, reducing development cycles significantly and yielding products of the highest quality. This asset is highly configurable and customizable, allowing for the simplest or most complex lithographic processes. In addition, TOKYO ELECTRON MARK8 Photoresist Model is easy to setup, use, and maintain, and provides an ideal solution for any photolithography need.
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