Used TEL / TOKYO ELECTRON Mark 8 #9098642 for sale

TEL / TOKYO ELECTRON Mark 8 photoresist equipment is an advanced optical system designed for lithography. TEL MARK8 is capable of utilizing very fine light to process materials. This photoresist unit is designed to work on a variety of substrates including metals, glasses, ceramics, silicon, polymers and various others. TOKYO ELECTRON MARK-8 utilizes an advanced optical machine that operates by exposing a photoresist material to short-wavelength light which is capable of being focused to a fine point. Material exposure takes place when the light source is integrated with a step and repeat camera assembly, which is capable of moving from one location to the next. For each location, the light source of Mark 8 is adjusted to more accurately expose photoresist material to create a more detailed image. MARK8 has a feature that allows users to take advantage of an advanced imaging tool in order to accurately turn designs into prototypes. The imaging asset is designed to observe model movement and balance exposure calculation of the photoresist material with each step. This feature allows for precision and accuracy for creating images. MARK-8 is also capable of having the source platform be adjusted with very fine resolution to create a higher resolution image. This feature allows the user to increase accuracy between each step. In addition, TEL MARK-8 is capable of controlling the photoresist material's exposure to light as well as the intensity and speed with which the imaging equipment moves from one location to the next. This helps to ensure that each step is accurately exposed in order to create a more detailed image. TOKYO ELECTRON MARK8 also incorporates an advanced feature set to help optimize processing and handling of the photoresist material. The system is equipped with automated batch loading and unloading, dispense control, wafer identify, pattern recognition, post-exposure baking and other necessary functions. TEL / TOKYO ELECTRON MARK-8 is an advanced unit designed for imaging and lithography application. The photoresist machine is capable of utilizing very short-wavelength light to expose material in order to create a more detailed image. TEL Mark 8 features and advanced imaging tool, allows for very fine resolution image adjustment, and is also equipped with automated loading, unloading, and other necessary functions to ensure precision and accuracy are achieved.