Used TEL / TOKYO ELECTRON Mark 8 #9098643 for sale

TEL (TOKYO ELECTRON) TEL / TOKYO ELECTRON Mark 8 is a Photoresist Equipment designed for use in lithographic processes. TEL MARK8 is a lithography system used in microfabrication and microelectronics for the creation of semiconductor devices. The unit consists of a mask alignment machine, a wafer stage, a Photoresist Tool, and an optical tool. The mask alignment asset consists of two main components: a stage motion control unit that controls the stage motion and a wafer alignment unit. The wafer alignment unit is used to capture and align the wafer to the mask. Additionally, a two-dimensional alignment is achieved using an encoder model. This ensures that the wafer is aligned accurately and precisely. The wafer stage performs the job of physically transferring the wafer to the mask. The stage is equipped with motion control mechanisms such as low inertia linear actuator, air feedthroughs, and three-phase encoder systems. These mechanisms enable the motion of the wafer stage accurate and precise. The Photoresist equipment is used to coat the wafers with a photosensitive film. TOKYO ELECTRON MARK-8 is equipped with a chemical supply unit, a vacuum dispense unit, a gas control unit, and a heating unit. The chemical supply unit is used to fill and refill the tank with chemicals for coating the wafer. The vacuum dispense unit is used to create a vacuum on the wafer so that the photoresist can be applied evenly on the wafer. The gas control unit is used to ensure a safe and contamination free environment. The heating unit is used to keep the chemical at a regulated temperature. The optical tool of TEL MARK-8 is used to expose the wafer to light. The tool is equipped with illumination optics and imaging optics. The illumination optics allow for the light to pass through the mask and be projected onto the wafer. The imaging optics allow for the imaging of the wafer to help with the alignment process. TOKYO ELECTRON MARK8 is equipped with a range of cutting-edge technologies to ensure accuracy and precision in the lithographic process. The accurate alignment of the device stage and the precise control of the chemical supply unit ensure the uniform and reliable deposition of photoresist onto the wafers. The mask alignment system and the imaging optics provide accurate and quality imaging. The combination of these features provides Mark 8 with the necessary tools to create some of the most advanced semiconductor devices.