Used TEL / TOKYO ELECTRON Mark 8 #9098648 for sale

TEL / TOKYO ELECTRON Mark 8
ID: 9098648
Wafer Size: 8"
Vintage: 1995
(1) Coater / (2) Developers System, 8", 1995 vintage.
TEL / TOKYO ELECTRON Mark 8 is a photoresist equipment designed to focus on critical lithography applications. Photoresists are chemical solutions designed to be selectively exposed to light, creating temporary surface alterations. Photoresists have long been used in a variety of custom industrial applications, from microlithography to film-packaging. TEL MARK8 photoresist system is an enhanced branch of TEL-branded TOKYO ELECTRON line. Its manufacturer uses a patented design to ensure uniform film deposition over the entire substrate surface, allowing it to achieve a very high degree of accuracy. It has also been designed with a user-friendly interface, allowing for intuitive use by users of all experience levels. Its advanced features include a pulse-programmable exposure area, allowing for the precise shaping of a required pattern that is then exposed. It also has a dual gate aperture to control the size of the aperture, limiting the amount of light that can be absorbed during exposure. TOKYO ELECTRON MARK-8 unit is able to achieve excellent results with little distortion, thanks to its advanced proprietary algorithms. It achieves this through the use of finely tuned exposure levels and precise control over the concentration of photoresists. By employing linear linear mode scanning, the machine is able to provide results with optimal resolution and no over- or under-exposure. The photoresist itself is also an incredible feat of technology. It has been designed to resist any damage from UV radiation and has been tested to be stable for use with any solvents. What's more is that it features an improved, broad-spectrum sensitivity range, giving it a wide-reaching performance range that allows for very precise and detail-oriented processes. MARK-8 photoresist tool has been lauded for its remarkable performance, but also for its reliability. Its rigidity and stability makes it a suitable choice for lithography and other related processes in the industrial sector. Its efficient operation also helps reduce costs, as users can expect to save on energy and resources. With its ease of use, high-precision output, and excellent resistance to damage, this photoresist asset is sure to be an ideal choice for many businesses.
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