Used TEL / TOKYO ELECTRON Mark 8 #9109448 for sale

TEL / TOKYO ELECTRON Mark 8 is an advanced photoresist equipment engineered to provide high-accuracy patterning with precise controllability over the exposure process. This system enables the coating of thin layers of film onto a semiconductor wafer for wafer processing applications, including lithography and etching. The unit includes a powerful stepper, an automatic controller, an optical imaging machine and a motorized stage. The stepper, the heart of the tool, is equipped with a wide angle and a narrow angle lens to provide the required illumination angles for photo-resist processing. The stepper also has a motorized wafer stage and detector that enable precise alignment of the wafer with respect to the optical asset, thus allowing accuracy within a fraction of a micron. The stepper also includes an alignment mechanism which provides the 3-axis adjustments necessary for optimal imaging performance. The automatic controller, which is connected to the stepper, provides all the necessary control parameters such as wafer position, step size, exposure dose, and exposure time. With these parameters, the operator can effectively control the exposure procedure to ensure that the optimum image size is achieved. The optical imaging model of TEL MARK8 includes a DMD (Direct Mask Data) imaging equipment with a large illuminated field of view, allowing for the rapid and accurate alignment of the projection optics. This system can be adjusted to accommodate the various exposures needed for an individual lithography application. Lastly, the motorized stage enables the unit to be moved to the next wafer position without having to manually reset the device. TOKYO ELECTRON MARK-8 photoresist machine provides a combination of high accuracy and precise controllability, making it an exceptional choice for wafer processing applications. With this combination, it enables manufacturers to quickly yet accurately create wafers with high-resolution images. This, in turn, can significantly improve the productivity of the wafer manufacturing process.