Used TEL / TOKYO ELECTRON Mark 8 #9109451 for sale

TEL / TOKYO ELECTRON Mark 8 Photoresist Equipment is designed for advanced photoresist processing in wafer fabrication. It provides precision photolithography for wafer fabrication processes in the semiconductor industry. TEL MARK8 Photoresist System uses a high- resolution mask aligner to align and expose photoresist films onto the wafer surface. It is equipped with a high-speed laser to provide precise alignment of the photomask to the wafer. The aligner also has an automated spray alignment capability with an adjustable pitch range to meet the requirements of different wafer designs. The photoresist material is held in a tank which can be designed to suit the size of the wafer. The material is pumped to a heat chamber which is heated to the required temperature and then transferred to a spinner station. The photoresist is spun on to the wafer at a controlled speed to form a thin layer of photoresist. At the same time, the photoresist is exposed to ultraviolet light from the mask aligner and direct imaging tool to enable the required result. This process is known as exposing the photoresist. TOKYO ELECTRON MARK-8 Photoresist Unit has a feature called "Multi-layer Photoresist Spray" which is designed for high precision wafer fabrication processes. This feature allows the photoresist to be sprayed in multiple layers on the wafer. After each layer is sprayed and exposed, the material is heated or cooled to fix the photoresist layer. The developed wafer is then transferred to a developer station where a chemical developer, such as an alkaline solution, is applied to strip away the exposed photoresist from the wafer. The final result is a clean wafer ready for further processing. For consistent results, the machine is equipped with a temperature and pressure control tool for better control over the various steps in the photoresist process. The asset also comes with various software tools, which enable the user to monitor and control the photoresist process from start to finish. TEL MARK-8 Photoresist Model is also compatible with a wide range of other wafer fabrication equipment, ensuring easy integration of photolithography processes into the larger wafer fabrication process.