Used TEL / TOKYO ELECTRON Mark 8 #9115313 for sale

TEL / TOKYO ELECTRON Mark 8 is a photoresist equipment that is used in the semiconductor industry for the photolithographic processing of wafers. The system is capable of handling substrates ranging from 200mm- 450mm, and is well-suited to both mask-based and direct-write processes. The unit includes an equiped cleaning machine that can be used to clean and rinse the substrates prior to processing. It has a built-in substrate input/output unit that makes it very efficient and easy to use. There are several different types of photoresist used with the tool, including positive, negative, and positive/negative. TEL MARK8 uses a stepper to precisely move the substrate to the desired location, as well as a wafer stage which is capable of rotating, raising and lowering, and base zooming in all directions. It is also equipped with an eight-zone gas delivery asset that allows for a higher degree of control over process parameters, which is especially useful when processing thin films. The model has a built-in radiation source which consists of an excimer laser, an ion source, and a scanning electron beam source. It also has a vacuum processing module that enables processes such as evaporation, sputtering, and sputter deposition. TOKYO ELECTRON MARK-8 is well suited for applications such as high-density interconnection formation, micron-level pattern formation, and through-hole lithography. In addition, it is capable of creating advanced film systems such as passivation layers, isolations layers, and photomasks. It has a feature-rich platform that allows users to perform all type of fabrication and processing requirements Overall, TOKYO ELECTRON Mark 8 is a very reliable and advanced photoresist equipment that is capable of handling a wide variety of substrates and photoresists, as well as offering a wide range of features and capabilities. It is a highly popular system in the semiconductor industry for its versatility and ease of use, and is capable of accomplishing a variety of photolithographic processes accurately and quickly.