Used TEL / TOKYO ELECTRON Mark 8 #9158967 for sale

TEL / TOKYO ELECTRON Mark 8 is a closed-loop photoresist process control equipment, designed for the production of semiconductor devices. It consists of a set of advanced control algorithms that measure, in real-time, the status of photoresist chemical concentration and temperature for the processing of photoresist on wafers. The system therefore provides an extremely precise control and monitoring of the photoresist chemical concentration and temperature, which is necessary for optimal photoresist development. TEL MARK8 consists of two main components: a control unit and a measurement unit. The control unit consists of a number of modules including a data acquisition machine, a signal processing tool, and a digital control asset. The data acquisition model is responsible for capturing the relevant sensor signals, which include the photoresist chemical concentration and temperature. The signal processing equipment carries out data analysis and pre-processing tasks, and the digital control system implements the control algorithms, which monitor and adjust the photoresist chemical concentration and temperature as required. The measurement unit consists of a number of probes installed at various locations within the chamber. These probes are responsible for measuring the chemical concentration and temperature of the photoresist, in order to enable the control algorithms to effectively adjust the process parameters. TOKYO ELECTRON MARK-8 is easy to integrate into existing setups thanks to its standard interfaces. The machine also provides high reliability, as it carries out rigorous self-diagnostics on all modules and instruments, as well as continuous data analysis to ensure that the photoresist is being processed correctly. It also has the ability to store data for future analysis, making it easy to ensure that any problems are addressed quickly. Overall, TEL MARK-8 is an advanced and reliable photoresist process control tool, designed to provide extreme accuracy in the processing of photoresist on wafers. It features advanced control algorithms, ability to store data for future analysis, and high reliability, all of which make it an ideal choice for semiconductor device manufacturing.