Used TEL / TOKYO ELECTRON Mark 8 #9206056 for sale

TEL / TOKYO ELECTRON Mark 8
ID: 9206056
Coater / Developer system.
TEL / TOKYO ELECTRON Mark 8 is an advanced photoresist equipment used for highly precise lithography processes. It is built for ultra-high resolution imaging, boasting a top resolution of half a micron (0.5μm). It is comprised of several components, which work together to create a complete photoresist patterning system. At the core of the unit is the imager, which reads the photomask and then projects an image onto the photoresist coated wafer. It uses the most advanced microlithography techniques, such as KrF excimer laser light source and quadrupole mirrors, to focus the image and precisely transfer it onto the wafer. TEL MARK8 also features an automated wafer alignment machine. This allows the tool to accurately align a pattern on a photomask onto that same pattern on a wafer. This ensures that the pattern will be precisely replicated. The asset's advanced optics, high-resolution imaging, and automated alignment model make TOKYO ELECTRON MARK-8 ideal for applications that require extreme accuracy and precision in their processes, such as semiconductor and microelectronics production. Additionally, TEL / TOKYO ELECTRON MARK8 includes a wafer exposure equipment. This system is responsible for exposure, development, and resist processing of the wafer. It does this with through advanced stepper, aligner, developer, and resist unit components. The result is high-quality, low-cost patterning with a very high yield rate. Finally, TEL MARK-8 is designed for the most exacting environments and offers a comprehensive safety package. The machine is designed to meet various safety standards, such as having a Class 1 laser and local exhaust tool, ensuring that operators are protected during photoresist exposures. In conclusion, TEL / TOKYO ELECTRON MARK-8 is a powerful and reliable photoresist asset, designed to offer very precise lithography processes with high yields. Its core components feature microlithography technologies, automated wafer alignment, and an integrated wafer exposure model. Additionally, the equipment is designed to be safe and reliable in demanding production environments.
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