Used TEL / TOKYO ELECTRON Mark 8 #9207242 for sale

TEL / TOKYO ELECTRON Mark 8 Photoresist Coating and Developing equipment is the latest in cutting-edge coating and developing systems for modern photonics device fabrication. This state-of-the-art system is designed for high precision and ultrafine dimensional control of photosensitive material. The unit is composed of two basic components, the Coater and the Developer. The Coater is a highly precise automated vacuum deposition machine that utilizes Subland Layer Coating (SLC) technology. This technology allows for uniform deposition of photosensitive materials for use in lithographic processes. The Developer is a fully immersive water bath tool that is capable of developing the photosensitive material to a required degree of resolution. TEL MARK8 Photoresist asset utilizes a number of advanced technologies, such as Angular Scatter Measurement (ASM), Multiple Pattern Overlay (MPO), and Uniformity Enhancements (UE) to ensure uniform coverage and exposure of the desired photosensitive material. These features provide enhanced detail and precision when coated to the device. TOKYO ELECTRON MARK-8 model is capable of processing large substrates with both direct coating and development. This capability provides high accuracy results with minimal defects, improving yields and performance. Another key feature of the equipment is its innovative 'foot print magazine', which allows users to store multiple coated patterns in the magazine for easy access and transfer. TEL MARK-8 Photoresist Coating and Developing system is also equipped with a range of safety and environmental controls. It is designed to comply with the latest legal and industry standards and has been rigorously tested and certified for safety and compliance. In conclusion, TOKYO ELECTRON MARK8 Photoresist Coating and Developing unit is a cutting-edge, precise, and reliable machine for the coating and developing of photosensitive material. It is equipped with a range of advanced features, as well as safety and environmental controls, ensuring uniform coverage and exposure for precise lithographic processing.