Used TEL / TOKYO ELECTRON Mark 8 #9216280 for sale

TEL / TOKYO ELECTRON Mark 8 photoresist equipment is a high-performance photolithography system designed to produce precision microelectronic devices. It utilizes advanced photoresist technology to quickly and accurately pattern semiconductor wafers with tiny circuitry. TEL MARK8 unit is equipped with an advanced wafer scanning machine which utilizes dual-beam laser patterning to precisely place and expose tracks of photoresist on wafers. The scanned laser also has the capability to adjust focus, pulse width, and power levels, allowing for extremely accurate processing of the photoresist layer. This scanning tool, combined with the advanced photoresist formulation, allows for precise and repeatable photoresist processing of multiple wafers simultaneously with minimal setup time. TOKYO ELECTRON MARK-8 also features a dual-beam laser scanning asset that is equipped with an Upper/Lower Lens Pattern Correction Option which further enhances the performance of the model. This feature allows the laser scanner to compensate for any surface sag or deformation of the wafer due to processing temperatures or exposure times. The equipment also has an advanced lithography management suite which includes secure storage of wafer patterns and quick transfer of data between wafer and program system. TEL / TOKYO ELECTRON MARK-8 unit is designed for both production and research environments and is backed by the robust continuous process support technology offered by TEL. The machine is equipped with user-friendly production management tools and automated run-time analysis that aid in monitoring and optimizing the performance of the tool. Overall, TOKYO ELECTRON MARK8 photoresist asset is an advanced photolithography model for producing precision microelectronic devices. It has a dual-beam laser patterning equipment for increased accuracy and speed and an advanced lithography management system for user-friendly production management. The advanced photoresist formulation and Upper/Lower Lens Pattern Correction Option offers superior performance for repeatable photolithography of multiple wafers.