Used TEL / TOKYO ELECTRON Mark 8 #9216917 for sale

TEL (TEL / TOKYO ELECTRON Mark 8) is an advanced photoresist system that offers the latest in photolithography utility. With its configurable waverfront correction capability, this system is capable of producing highly precise patterns across a semiconductor wafer. Automated operation facilitates aligned overlay, overlay integrity tests, and autofocus. TEL MARK8 also provides support for stepper-assisted pattern generation, with the capability to fine-tune the sub-resolution grid, which are extremely useful for micro-processing in the semiconductor industry. TOKYO ELECTRON MARK-8 is equipped with two illuminators, the main illuminator, and the OPT mode. The main illuminator allows for a wide variety of quartz, quartz-halogen, diffuse, and laser-based illumination sources for high-resolution resists. The OPT mode features a specialized set of illumination sources, providing image light throughout the entire wafer with greater efficiency and uniformity than the main illuminator. TEL Mark 8 offers a variety of options for the development and transfer of photoresist patterns. With its Precise Imaging Kit, patterns can be developed directly into the photoresist layer, thus eliminating the need for a pre-plating step. Furthermore, either positive or negative photoresist can be transferred from the main resist layer to the underlying substrate with the Substrate Transfer Kit. TEL MARK-8 offers an array of features to facilitate process optimization. Examples of optimization capabilities include optimized exposure time, variable exposure dose, and precise control of exposure radius. The system also offers freely-definable process recipes for particle removal, semiconductor wafer cleaning, and spin-coating. TEL / TOKYO ELECTRON MARK8 leaves users with the high-quality images necessary for semiconductor production in the 21st century. Not only does its optically fine-tune its image during photolithography, but it also provides users with the flexibility required to accommodate ever-changing industry trends. Its automated capabilities include image overlap correction, overlay control, and photoresist process optimization. Moreover, MARK8's adjustable illumination sources and image data delivery techniques enable users to produce precision images with exceptional throughput.