Used TEL / TOKYO ELECTRON Mark 8 #9237369 for sale

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ID: 9237369
Wafer Size: 8"
Vintage: 1999
(2) Coater system, 8" Main controller version: 9821KE CSB: (3) Loaders COT (Coat process station): 3 Nozzles (2) RRC Pumps Solvent automatic supply: (2) Tank auto supplies, CCSS Side rinse (EBR) Back side rinse (BSR) Dev solution automatic supply: Local (6) LHP (Low temperature hot plate stations) Chemical box Temperature controller T&H C/S: CRA Motor Mapping sensor Tweezer Alarm tower Display panel Coater: Chuck ARM 1 ARM 2 COT Cup Nozzle Drain type: Factory direct drain Coater: Chuck ARM 1 ARM 2 DEV Cup Nozzle Drain type: Factory direct drain PRA: Pincette Sensor Bake: (6) HP Units (4) Cool units 1999 vintage.
TEL / TOKYO ELECTRON Mark 8 is a computer-controlled photoresist equipment designed to apply an even layer of material onto the surface of a silicon wafer. This system is composed of a laser irradiation unit, an optical head, a sample stage, and a computer-controlled machine. The laser irradiation tool includes a pump laser diode and a pump laser cavity. When an optical signal is applied to the diode, the laser emits a narrow beam of infrared light which is then routed into the laser cavity which further amplifies the signal to many times its original power. The amplified signal is then redirected out of the cavity and into the optical head. The optical head includes several optical lenses and a beam splitter which determines the shape and size of the output beam. The sample stage is used to hold the wafer and is connected to a computer-controlled asset that coordinates the precise movement of the stage and the laser. The computer-controlled model can vary the exposure of the laser, depending on the properties of the photoresist material used. This equipment can also alter the size and shape of the beam to ensure exacting exposure of the photoresist. After exposure, the photoresist is removed from the wafer and the wafer is ready for further processing. TEL MARK8 is a highly advanced computer-controlled photoresist system which is capable of producing accurate and uniform layers on silicon wafers. This unit is used in the wafer fabrication process in order to build complex circuits and components used in many different industries. Its precision makes it an ideal tool for many types of applications.
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