Used TEL / TOKYO ELECTRON Mark 8 #9239617 for sale

TEL / TOKYO ELECTRON Mark 8 Photoresist Equipment is an advanced exposure tool that is capable of delivering high resolution patterning features for a wide array of applications. This advanced system is used in many photolithography processes, allowing for fast, accurate and reliable patterning on substrates. The unit utilizes advanced, mini-array optics to deliver patterning with resolution down to a few hundred nanometers, making it ideal for lithography processes and a range of other advanced processes. TEL/TOKYO TEL MARK8 is capable of generating highly accurate patterns on wafers, substrates and components with precision and reliability. It utilizes advanced laser transfer systems, allowing for reliable exposure of substrates without generating thermal or mechanical stress. This high-precision machine is capable of providing patterning down to the nanometer level. Additionally, the tool uses light scattering technology, which achieves faster exposures and improved precise definition of patterns. The asset has been designed to provide precise patterning of substrates with a minimum of wasted material. This is accomplished through the use of an advanced ablation model. Ablation is a process where a substrate is exposed to a high intensity laser beam which removes material in the areas that need to be patterned. The equipment also offers a range of other advanced features such as a powerful auto-alignment system, which ensures that the beam remains precisely aligned with the substrate's pattern. TOKYO ELECTRON/TOKYO TOKYO ELECTRON MARK-8 is also highly scaleable and upgradable. It can be configured with the latest software and hardware upgrades, giving users the flexibility to keep up with the latest technology advancements. TEL / TOKYO ELECTRON/TOKYO TEL Mark 8 is the perfect tool for all photolithography requirements. With its high precision and reliability, the unit is able to provide the necessary patterning to substrates with ease and accuracy. It is capable of delivering patterning down to the nanometer level, ensuring high-precision results. This machine is an invaluable tool to any laboratory or manufacturer involved in photolithography based processes.