Used TEL / TOKYO ELECTRON Mark 8 #9276285 for sale

TEL / TOKYO ELECTRON Mark 8 is a photoresist equipment designed for use in semiconductor fabrication. It is a system of techniques used in the lithographic process to transfer shapes from a patterning device or reticle onto a wafer. TEL MARK8 is the most advanced photoresist unit of its generation, employing several advanced techniques to ensure the most reliable production of features down to the nano-scale. The machine is comprised of two separate components - a photoaligner and an exposure tool - both of which are controlled by a sophisticated computer processing unit. The photoaligner utilizes a laser scanning asset that is used to create a pattern template with a very fine resolution of 20 nanometers or less. This template is then fed to the exposure model, which utilizes a UV light source to "burn" the shapes onto a wafer. TOKYO ELECTRON MARK-8 is equipped with advanced software which can control the resolution of the process and ensure quality control over each feature created. It uses a distributed optical correction equipment and multiple stages of pattern generation to achieve the consistently fine resolution over large numbers of parts. The system can also adjust process parameters such as exposure time to compensate for the optical distortions of the unit. Additionally, TEL / TOKYO ELECTRON MARK-8 employs two different processes - the i-Line process and the EUV process - to further optimize the lithographic process. The i-Line process uses a source of ultraviolet light with a range between 13.5 and 13.6 nanometers to create structures with very fine lines down to 3 nanometers in size. The EUV process features a source of extreme UV light with a wavelength range of 13.5 nanometers and shorter. This process creates even finer structures with a resolution of 0.3 nanometers. MARK8 is an advanced photoresist machine designed to enable reliable and consistent production of semiconductor features with nano-scale resolutions. It utilizes several unique and advanced techniques to create templates, adjust process parameters, and optimize lithography. The tool can produce features with resolutions down to 3 nanometers with the i-Line process, and even finer resolution of 0.3 nanometer with the EUV process.