Used TEL / TOKYO ELECTRON Mark 8 #9305864 for sale

TEL / TOKYO ELECTRON Mark 8 is a photoresist equipment designed specifically for high-resolution, high-precision photolithography. It offers a powerful combination of features to enable efficient production of complex integrated circuits, including sub-micron resolution, an advanced photomask alignment system and an extended exposure range. The unit utilizes state-of-the-art resist materials and processes to ensure precise feature definition, while the pre-baked photomask technology ensures high-performance resists. A full field scanning machine ensures accurate alignment and accurate optical exposure, while the Extended Dynamic Range (EDR) feature offers superior image fidelity. TEL MARK8 utilizes an advanced stepper tool for precise feature definition, with an ultra-precise anchor-point alignment feature for accurate placements of sub-micron features. The asset also includes an auto focus model for accurate alignment and lens focusing. Additionally, the equipment includes a suite of tools and technologies for measuring lens performance and profile adjustment, as well as control of resist profile properties and other parameters. The system hardware includes a resist delivery unit, which delivers resist to the wafer, as well as a scan control unit for controlling alignment and resists exposure, allowing for precise feature control. The high-definition optical module includes a 12-poled mirror machine, as well as dual-rod spheric heater, ultraviolet transmitter, laser spot monitor, and image viewer. An integrated protocol generator enables full control and customization of the parameters used during the photolithography process, while the application software provides powerful data analysis capabilities. TOKYO ELECTRON MARK-8 also offers precision metrology in a variety of modes, including brightfield imaging, scanning electron microscopy (SEM), reflected image analysis and variable-angle light scatterometry. All of these metrology techniques are available in real-time and are supported at an architecture and throughput level suitable for the most demanding production designs. Overall, MARK-8 photolithography tool is a powerful, versatile and reliable machine that offers superior performance and precise feature resolution. Supporting all of the most advanced photomask technology, with extended dynamic range, it is ideal for closely patterned circuits and high-volume production.