Used TEL / TOKYO ELECTRON Mark 8 #9314251 for sale

ID: 9314251
Wafer Size: 4"
(3) Coater system, 4".
TEL / TOKYO ELECTRON Mark 8 photoresist equipment is a fully integrated system for developing and patterning photoresists. It provides industry-leading accuracy and repeatability for patterning even delicate structures with high aspect ratios. The unit combines state-of-the-art hardware and software components to provide a comprehensive solution for patterned photoresist processing. TEL MARK8 utilizes a motorized stage with precision linear drive and a high-resolution digital microscope to allow precise positioning and manipulation of the photoresist material. This stage can accurately repeat patterns and movements to increase throughput. The stage is computer-controlled through the control software, which simplifies the setup and analysis of the process parameters. The machine also includes precision ultraviolet (UV) irradiation and optics for patterning the photosensitive material. TOKYO ELECTRON MARK-8 features a multi-wavelength light engine with motorized attenuator for controlling the exposure dose. The light engine also has an adjustable collimator for narrowing the exposure field and a shutter for burst mode exposure. TEL Mark 8 has an integrated software package, which includes software for controlling the exposure and optical parameters, as well as standard visualization, algorithm, graphics, and analysis tools. Full-featured job planning, recipe editing and data management are also included. The software is designed to match the user's production and research needs. TEL MARK-8 tool is designed for use with photosensitive materials such as resist, acrylate, and other photosensitive polymers. It is also compatible with various patterning techniques such as spin, spray, and aerosol coating and can be used for both positive and negative patterning. The asset has been developed with a focus on process control, accuracy, quality, and speed. This allows the user to achieve better results in a shorter amount of time. All of these elements combine to form an advanced photoresist model capable of producing precise and repeatable patterns, even at the nano-scale. Mark 8 photoresist equipment provides an ideal solution for research and production patterning applications for a variety of industries.
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