Used TEL / TOKYO ELECTRON Mark 8 #9314262 for sale

TEL / TOKYO ELECTRON Mark 8
ID: 9314262
Wafer Size: 8"
(1) Coater / (2) Developer system, 8" ADH (8) HP (3) COL Inline Interface.
TEL / TOKYO ELECTRON Mark 8 is a photoresist equipment designed for use in semiconductor circuit boards. It is used for fabricating ultra-thin circuitry on wafers and ICs, as well as for masking and lithography processes. The system is designed to provide reliable and accurate resolution, as well as high-precision registration. The unit combines a high-power UV source, a beam geometry machine, and a projection point of view to deliver precise uniformity in the production of advanced layer patterns on the wafer. The tool is capable of producing clearly defined images in the form of a mask or a lithographic pattern. The asset also includes a controller that is designed to provide a range of different control modes including constant-time, constant-current, and others. The controller can also be used to store and control various aspects of the model, including calibration, pre-raster control, and additional pattern formation parameters. The equipment is connected to a variety of sensors and other devices to provide a wide range of capabilities. For example, it can be used to measure the focus and alignment of each layer, and it can also be used to detect the resist profile of each layer. Additionally, it can be used to record profiles of the wafer surface for later review. TEL MARK8 is designed to support a wide range of photoresists and is appropriate for a variety of treatments such as thermal and ion beam treatment. It is also capable of several post-processing operations such as etching, deposition, and annealing. The system is designed to provide superior throughput and accuracy, making it an ideal choice for high-end semiconductor products. The unit is also designed to be easily operated and maintained, and is compatible with a variety of existing tools and equipment. Overall, TOKYO ELECTRON MARK-8 photoresist machine is designed to simplify the process of fabricating ultra-thin circuitry on wafers and ICs, providing precise resolution, high throughput, and excellent reliability. It is an ideal choice for high-end semiconductor products.
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