Used TEL / TOKYO ELECTRON Mark 8 #9314983 for sale

TEL / TOKYO ELECTRON Mark 8 photoresist equipment is one of the industry-leading systems for reliably designing, developing and manufacturing high-quality integrated circuits. Its innovative and versatile features enable the fabrication of complex and intricate designs with a minimum amount of waste, with minimal setup, cycle time, and cost. TEL MARK8 features an integrated pyrometer and cooling plate, and has a heated chamber that can reach temperatures between 500 and 1000 degrees Celsius. It also has a Vacuum-UV Polarization Optics system, which optimizes the polarizing and focusing capability of the lithographic projectors. This ensures that the most precise imaging possible is achieved. Additionally, the unit flourishes in providing user-friendly adjustable and repeatable process parameters. This allows for highly optimal and consistent lithography processes over extended periods of time. TOKYO ELECTRON MARK-8 also features a Capacity Drain (CD) Module that monitors and controls the volume of resist held within the chamber, allowing for consistent and repeatable results. Furthermore, its Photo Asher (PA) Module allows for early removal of the exposed resist and for more oxidation-free etching processes. Mark 8's Visual Inspection Machine (VIS) ensures that lithography results are closely monitored for process optimization. It can be used to detect and remove any residue from the wafer surfaces, as well as to verify pattern integrity before etching. The tool's Total Automation Asset (TAS) allows various tasks to be automated, enabling users to achieve greater throughput and quality. It supports data-driven operation to inspect lithography results and identify trends for optimization of the processes. Finally, MARK8's Image Sensor model is designed to provide quick and accurate data analysis and enable users to optimize and fine-tune equipment conditions to ensure high-accuracy lithography. MARK-8 photoresist system is a powerful and efficient tool for consistent, cost-effective, and accurate lithography. Its advanced features enable users to develop intricate designs with minimal setup costs and cycle time, while its integrated features ensure precision and enhance overall productivity.