Used TEL / TOKYO ELECTRON Mark 8 #9364571 for sale

TEL / TOKYO ELECTRON Mark 8 Photoresist Equipment is a photolithography system employed in the fabrication of small structures such as silicon integrated circuits. It is capable of printing resolution as low as 0.28 microns, allowing for the production of minimally sized components. The optical unit of TEL MARK8 is based on a five-component optical machine, consisting of a g-line light source (with a wavelength of 436 nm), an exposures lens, a shape correction optical tool, an objective lens, and a reticle which contains the master pattern. The principal component of TOKYO ELECTRON MARK-8 is the exposure asset, which consists of an illuminator source, an exposure optics lens that directs the light onto the wafer, an illumination window and an image measurement model (EMS). The illuminator source produces energy-efficient lasers at 435-438nm, which is then collected, collimated and focused onto the photoresist-covered wafer by the exposure optics lens. The wafer is then positioned onto an X-Y stage for movement along the x-y axis. To ensure accurate position control, the excitation of the magneto-inductive measuring equipment and the zero-deflection system is used. The pattern of the photoresist layer that is transferred to the wafer is then checked for errors using the EMS unit. The EMS machine uses charge coupled devices (CCDs) to absorb the light reflected from the pattern and creates a virtual map of the limited pattern using optical methods. TEL / TOKYO ELECTRON MARK8 tool uses processes such as spin-coating, pre-baking, exposed to laser light, post-exposure baking, and development. Once the wafer is spin-coated and pre-baked, it is then exposed to the laser light from the illuminator source that is focused onto the surface of the wafer using the exposure optics lens. After the exposure, the wafer is post-exposure baked, followed by a development process using methanol or a mild acid to remove the exposed photoresist layer, leaving behind the pattern imprinted on the wafer. TEL / TOKYO ELECTRON MARK-8 asset also includes numerous safety features such as a shutter release model that prevents long-term exposure of the light source, increased flame retardant polystyrene internal structure and using a nitrogen-containing environment for variable pressure resist coating. Additionally, the placement of the wafer and the movement of the X-Y stage is controlled by a computer equipment with low voltage control electronics housed in its control cabinet. These features allow TEL Mark 8 to provide a high degree of accuracy, cleaner production, and minimized particle contamination both during the manufacturing process and end-user use. TEL MARK-8 Photoresist System is an essential tool for the production of highly accurate and reliable transistor level electronic devices.