Used TEL / TOKYO ELECTRON MARK II #293748580 for sale

TEL / TOKYO ELECTRON MARK II Photoresist Equipment is a state-of-the-art system offering state-of-the-art performance in photolithography. Photolithography is a tool used within the fabrication process of semiconductors and other electronic devices to create features and patterns in a substrate. TEL MARK II Photoresist Unit is designed for use in ultra-small, high-precision lithography applications. The powerful yet compact machine offers fast and accurate photoresist coating and imaging capabilities. The tool is equipped with a high-precision liquid dispenser, programmable robot arm, and an imaging asset that allows for precise control over exposure and interval parameters. The model's high-precision liquid dispenser is designed to deposit a uniform layer of the photoresist over the substrate. The robot arm then precisely positions the material for exposure to light, and the imaging equipment provides accurate control over the intensity, duration, and incident angle of the exposure. The system features a three-stage exposure unit, consisting of a light source, belt machine, and photo mask. The light source consists of a variety of xenon arc lamps, UV laser diodes, and DXR sources, providing a range of exposure intensities and pulse lengths. The belt tool is equipped with various features, such as an X-Y translation stage, a focused zoom microscope with a range of extensions, and stepper motor-driven focus and zoom control. The photo mask is used to precisely transfer image patterns to the substrate. The asset also includes an integrated liquid-dispensing robot, a chemical processing robot, and a real-time monitor. The liquid-dispensing robot places a uniform, porous coating of photoresist onto the substrate, and the chemical processing robot controls the application, baking, chemical processing, and post baking for the preparation of the substrate for exposure. The real-time monitor assists the operator in monitoring the injection and curing processes, exposing the substrate to the light source, and controlling post-exposure baking parameters. In addition, the model is equipped with a range of metrology functions to ensure accuracy and uniformity across the board. These functions include micrometer automated alignment, focus depth observation, and light measurement during photolithography. Overall, TOKYO ELECTRON MARK II Photoresist Equipment offers unparalleled accuracy, precision, and repeatability in creating features and patterns in a substrate. With its innovative features and capabilities, the system can be used to create virtually any feature size and complexity imaginable.