Used TEL / TOKYO ELECTRON MARK II #293778059 for sale

TEL / TOKYO ELECTRON MARK II is an automated photolithography equipment designed to produce semiconductor photoresists. It combines an automatic alignment and exposure system, along with other automated features, to accurately expose a variety of photoresist and masking materials. The unit includes a wafer stage coupled with an automated aligner and exposure unit, along with an advanced optical machine and automation software specifically designed to specialize TEL MKII for photolithography applications. The wafer stage uses a vacuum chuck to hold the wafer in place and utilizes an elaborate kinematic mounting tool to ensure precise, repeatable stage motion. The automated aligner and exposure unit features an optimized illumination asset and maintains a high degree of accuracy and repeatability. TOKYO ELECTRON MKII also has a high-precision optical model to enable precise adjustments in light intensity, focus, and wavelength. It also uses automated image analysis and control software to ensure accuracy and consistency. This control software allows for accurate control over exposure time, image resolutions, and exposure parameters. TEL / TOKYO ELECTRON MKII offers a wide range of photoresist materials for use with its automated alignment and exposure equipment. These photoresist materials are specially designed to optimize performance for specific photolithographic purposes. This allows for faster and more accurate exposure of photoresists onto substrates, with many of the photoresist materials demonstrating improved resolution as compared to conventional materials. TEL MKII is also fully compatible with a variety of masking materials. Its advanced automation software allows for accurate and repeatable masking and registration of media, as well as high resolution imaging via its specialized optical system. This unit allows for more complex light-field and image-field masking processes. TOKYO ELECTRON MKII is an efficient and reliable photoresist machine that provides consistent and high-quality results. It is an ideal choice for applications ranging from lithography to UV exposure and masking. Its automated alignment and exposure tool, along with automated software control and a variety of photoresist and masking materials make it an excellent choice for any photolithography need.