Used TEL / TOKYO ELECTRON MARK II #9181758 for sale

TEL / TOKYO ELECTRON MARK II photoresist equipment is a top-of-the-line photoresist apparatus used in photolithography and microelectronics fabrication. Photoresist is a light-sensitive material that is used to create patterns on a semiconductor material in order to fabricate a semiconductor device. TEL MARK II utilizes latest technology to provide precise, repeatable conditions for photoresist processing. The system is made of several parts, including a processor unit, a digital interface, a photoresist gain controller, a chamber control, and a wafer handling unit. The processor unit can support up to 30 different types of containers for processing photoresist, including traditional spin-on and spray-on applications. This ensures that a wide range of photoresist can be used with TOKYO ELECTRON MARK II machine. The processor unit also includes temperature and time-based programmable parameters, and option of a photo-granulometer for assessing the quality of the photoresist. The digital interface provides for easy integration of the tool with other photolithography systems and allows for a streamlined, automated workflow. The photoresist gain control ensures that the correct amount of light energy is used during the exposure process. The chamber control module incorporates high-precision temperature control with a vacuum pump and recirculation loop allowing for a consistent process temperature for the photoresist. Finally, the wafer handling asset ensures delicate and accurate movement of the substrates during moving from the main processor unit to the chamber. The model also includes a equipment of sensors to constantly monitor the photoresist thickness, as well as real-time process data logging. This allows for modification of the process to account for changes in the photoresist thickness and shorten the process time. Additionally, there are environmental sensors that monitor the temperature and humidity of the photoresist environment. This ensures that the best possible conditions are maintained for the photoresist processing. Overall, MARK II is a powerful and advanced photoresist processing system. With user-friendly operation, top-notch performance, and delicate handling, it is the perfect unit for producing top-quality photoresist.