Used TEL / TOKYO ELECTRON MARK II #9181759 for sale

TEL / TOKYO ELECTRON MARK II is a deep-ultraviolet (DUV) photoresist equipment, designed for the production of advanced semiconductor devices. The system comprises of a full-featured, hybrid electron-beam and I-line off-axis exposure source, combined with a fully automated resist and etch processing station. The unit is ideal for semiconductor engineers seeking to reduce device manufacturing cycle time, while delivering high quality results. TEL MARK II is equipped with an advanced electron beam writing engine that offers low energy density, enabling minimization of resist scattering and allowing exposure of ultra-narrow features. The beam source can further be optimized for efficient patterning of features below 50nm. The exposure source is enhanced with an off-axis I-line exposure source, that enables rapid exposure of entire patterned area in a single step. The machine is more than an exposure source. It is also designed to reduce production times and improve process yield. It is equipped with a highly automated resist coating, baking and development tool, as well as an adapted etch processing module. This enables users to carry out entire process sequences with minimal manual intervention. This ensures a reliable and repeatable patterning process. TOKYO ELECTRON MARK II features advanced user friendly control software, based on a graphical user interface (GUI). The GUI is designed to reduce operability time and allow for quick and intuitive control of the asset for even the most complex processing sequence. Overall, MARK II is an advanced DUV lithography model capable of handling the most challenging patterning requirements. It enables users to reduce process times, increase yields, and improve device production quality. The equipment is ideal for those seeking to produce ultra-low-resolution designs with complete confidence in reliability and repeatability.