Used TEL / TOKYO ELECTRON MARK II #9226205 for sale

TEL / TOKYO ELECTRON MARK II is a photoresist equipment developed by the Japanese electronics company TEL. This system is a semi-automated full-field imaging technology designed to provide the highest degree of process repeatability and flexibility available on the photoresist market. It is one of the most comprehensive photoresist systems available and offers a wide variety of functions and advanced features. The main components of the unit are the aligner, stage, and resist station. The aligner automates the wafer alignment process and reduces the time needed for sample positioning. It also increases throughput by eliminating errors that can occur during manual alignment processes. The stage incorporates a three-axis positioner for maximum throughput and accurate positioning with nanometer resolution. The resist station is a fully automated machine capable of dispensing several resists simultaneously, resulting in higher throughput and reduced costs. TEL MARK II tool also includes scanner and metrology functions which enable the user to obtain detailed quantitative measurements of many parameters, including film thickness, material type, and topography. The asset features a wafer handling model which includes a universal holder capable of supporting not just traditional wafers but also a wide range of other substrates, including MEMS wafers, bonded wafers, and thin film patterns. TOKYO ELECTRON MARK II also provides advanced controls that allow the user to monitor, analyze, and modify the photoresist process. Advanced process control, such as the equipment's single-low power mode, allows the user to save energy by running a process at the lowest possible power levels. In addition, the system offers advanced monitoring functionality, which allows the user to view real-time data from the various process steps and adjust the process parameters on the fly. MARK II ensures high-precision results with low levels of variation, reducing both costs and time. These features, in combination with its flexibility, make the unit a reliable and efficient tool for photoresist processing.