Used TEL / TOKYO ELECTRON MARK II #9226207 for sale

TEL / TOKYO ELECTRON MARK II is a photoresist equipment that is designed for the development of advanced electronic circuit components. The system utilizes a new process of patterning and etching thin layers of dielectric and metals with the help of a special laser beam. Using this laser beam, a thin layer of photoresist is patterned onto a substrate, such as silicon wafers. This photoresist acts as a shield to protect the underlying circuit components from harmful etching and process liquids, while the laser pattern allows the etching process to be localized in certain locations. This photoresist unit is capable of high-accuracy and high-speed pattern inspection and fine pattern formation, making it suitable for applications such as semiconductor manufacturing, printed circuit board (PCB) fabrication, and MEMS (micro-electromechanical systems) device fabrication. In addition, TEL MARK II has a batch mode function that allows for multiple substrates to be patterned in one process, and a full-field pattern function that can easily change the pattern size of a foreign chip. TOKYO ELECTRON MARK II features an improved, high-accuracy and high-speed alignment machine, which can detect the orientation and size of a patterning-area substrate accurately and rapidly. This tool also features an autofocus and microscope integration asset, which allows for more accurate pattern inspection. Furthermore, the model provides an integrated lens auto-filling equipment that can fill any area with a given material quickly. This takes the guesswork out of deposition processes, as the material required for filling can be programmed ahead of time. The special MARK II mirror-shifting system enables the beam of the laser to enter precisely into the required area. Finally, TEL / TOKYO ELECTRON MARK II unit is well-suited for prototyping, as it is built with an automatic wafer transfer and an efficient self-monitoring feature. This allows manufacturers to quickly design and refine circuit components without having to manually transfer the material from one process to another. This machine also offers improved edge clearances and tolerances, further improving its prototyping capabilities. Overall, TEL MARK II tool is an advanced photoresist asset that offers high-accuracy and high-speed pattern inspection, fine pattern formation, and integrated auto-filling and mirror-shifting systems. This model is suitable for a wide range of applications, such as semiconductor and printed circuit board manufacturing, as well as prototyping.