Used TEL / TOKYO ELECTRON MARK II #9238268 for sale

TEL / TOKYO ELECTRON MARK II photoresist equipment is a highly advanced resist-processing based image-forming system that enables users to precise high-precision images onto various electronic substrates and components. In particular, the unit is suitable for use in the production of advanced semiconductor and microelectronic devices and components. The photoresist machine is an integrated platform that combines purpose-built processing elements, including the photoresist pre-exposure treatment unit, the deep trenching tool, along with advanced resist sectionalization and automatic dispense features. The asset is designed to process thin-film substrates, such as semiconductors, at ultra-high speed and with extreme levels of accuracy. Additionally, the model is capable of supporting a wide range of lithography techniques, including step-coverage (or "step-and-repeat") lithography, in which extremely precise layers of patterns are etched onto the substrate. The photoresist equipment is equipped with an advanced optical imaging system, which enables users to accurately form images by using ultraviolet lasers. The unit is also capable of performing various high-precision resist pre-treatment processes, including spin-coating, spray-coating, and pre-defined pattern development. In addition, the machine can be employed to execute deep silicon trenching processes, which enables users to create ultra-shallow trenches, with precise interval control. TEL MARK II photoresist tool provides a statistical process monitoring asset through which users can securely analyze the process parameters and create high-precision images with repeatable and reliable outcomes. Furthermore, the model boasts a low wavelength-ratio profile, which ensures total light transmission in the printing process. TOKYO ELECTRON MARK II photoresist equipment combines highly advanced optics and processing elements to enable users to accurately form fine-resolution patterns onto thin-film substrates. The system is highly reliable and accurate, with a wide range of lithography and resist pre-treatment processes, combined with a high-precision imaging unit that ensures repeatable and reliable results. Furthermore, its low wavelength-ratio profile ensures total light transmission in the printing process.