Used TEL / TOKYO ELECTRON MARK II #9269120 for sale

TEL / TOKYO ELECTRON MARK II
ID: 9269120
Wafer Size: 6"
Developers, 6".
TEL / TOKYO ELECTRON MARK II is a precision photoresist equipment that enables accurate pattern formation in substrates used in the manufacture of semiconductor devices. The photoresist system is part of an integrated production line for semiconductor fabrication which includes the formation of thin films and etching processes. TEL MARK II is composed of the photoresist processing module, the control module, and the film formation module. The photoresist processing module includes the wet bench, immersion, and spin-coater processes. The wet bench process involves the application of a wet photoresist using a micro-pipette. The immersion process uses an immersion unit composed of a tank, wafer lift, and monitor, which allows for automated processing. The spin-coater process applies the photoresist to the wafer surface and is used to create uniform layers of photoresist. TOKYO ELECTRON MARK II control module is composed of a user interface, automation software, and a controller. It allows for the selection of process parameters such as photoresist type, spin speed, exposure dose, and developing time. It also allows the user to program the production cycle for repetitive photoresist application. The film formation module of the photoresist machine is composed of two core components, a film modulator and a controller. It enables the production of ultra-thin films and etching patterns of any size. The film modulator allows for the accurate delivery of photoresist to the substrate and creates a uniform layer. The controller then allows for the accurate control of etching processes and is responsible for the overall automation of the film formation process. In conclusion, MARK II photoresist tool is a crucial part of the semiconductor fabrication process. It enables the production of thin films and etching patterns of accurate sizes and uniform layers, ensuring fast and efficient production.
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