Used TEL / TOKYO ELECTRON MARK II #9269135 for sale

TEL / TOKYO ELECTRON MARK II
ID: 9269135
Wafer Size: 6"
Coaters, 6".
TEL / TOKYO ELECTRON MARK II is a photoresist equipment used for performance patterning in semiconductor production. The purpose of the system is to create high-quality semiconductor photomasks for mask lithography using advanced electronic projection alignment technology. The unit incorporates an eight-axis mask alignment mechanism with a 10" large linear stage, high-resolution projection alignment and high-accuracy laser interferometry. This advanced alignment technology allows for increased mask fidelity and stability of repeated patterning processes. The machine utilizes an integrated detector unit and advanced image analysis functions to accurately detect and identify patterns even with low contrast and small line widths. This enables efficient modification of complex patterns, as well as ensures high-precision patterning and inspection. TEL MARK II utilizes a high-resolution optical imaging tool, with a 1.4 to 5.5µm depth of focus, to accurately project light onto the mask wafer. This allows for precise alignment between the mask wafer and the masking agent. In addition, the asset is equipped with a camera that can capture up to 64 megapixel images. The model also incorporates an array of automated measurement instruments such as diffraction, elastic scattering, photoluminescence, secondary ion mass spectrometry, and time-of-flight mass spectrometry. This helps ensure the accuracy and efficiency of data analysis. Lastly, the equipment's modern user-friendly design provides an intuitive and safe environment for software operations. This includes a graphical user interface, as well as programming language integration. Furthermore, the system includes a variety of software tools and libraries that help users streamline operations and eliminate down time. All in all, the advanced features of TOKYO ELECTRON MARK II unit make it an ideal tool for photoresist applications in semiconductor manufacturing. It provides reliable, high-performance patterning and can help improve operational efficiency while ensuring top-notch data analysis.
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