Used TEL / TOKYO ELECTRON Mark V #293591398 for sale

ID: 293591398
Vintage: 1992
Coater / Developer system 1992 vintage.
TEL / TOKYO ELECTRON Mark V is a photoresist equipment that uses a light source to create circuit patterns on a semiconductor surface. The system is typically used in future device manufacturing and R&D processes. The unit's light source consists of a scanning laser, which beams its output onto the surface of a semiconductor wafer that has been coated with photoresist. The laser uses different deflection angles to produce different patterns on the wafer. The photoresist is a type of radiation-sensitive material, which absorbs the laser light and is formulated to react with the intensity of the laser light. By varying the deflection angles, higher resolution circuit patterns can be produced with smaller features. The laser optics are of a lens-parabolic arrangement with a parallel-plate arrangement. TEL Mark V also features several types of integrated optics, including a telecentric lens for higher precision control. The laser also has an extended focal length for better illumination and can be adjusted to fine-tune the focus automatically. TOKYO ELECTRON MARK-V also features a variety of different alignment functions such as a Laser Beam Alignment Machine (LBAS) to program alignment surveys and a use a variety of different post exposure methods to fine-tune the process. TOKYO ELECTRON Mark V also features a proprietary Mask Data Interface (MDI) layer for faster data exchange between the various software layers. This improves the throughput of the device by allowing data to be sent back and forth. The tool also includes a cleanroom compatible exposure/aligner stations, which can be configured in various topologies to accommodate different throughput requirements. The asset is capable of working with single wafer exposure devices, or exposure on multiple wafers using synchronization techniques. The main advantages of Mark V is its high throughput, smaller feature sizes, and its ability to handle complex data transfer. It is ideal for advanced device manufacture and research and development processes.
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