Used TEL / TOKYO ELECTRON Mark V #293793330 for sale

TEL / TOKYO ELECTRON Mark V is an advanced photoresist equipment used for high-resolution semiconductor photomask fabrication. Photoresist systems are used to transfer patterns onto wafers for use in integrated circuit (IC) manufacturing. TEL Mark V is a reliable, high-performance system that enables precision for the market's most challenging devices. TOKYO ELECTRON MARK-V is built with a high-beam quality of 1.2 nm and features a Super High Readability (SHR) monitor unit to ensure the accuracy of processes across the entire disc pattern area. It boasts a customizable 15" LCD touchscreen display to maintain exceptional resolution of images. The machine controls resist layer thickness and isotropic etch rate through a comprehensive suite of software and automated processes. These include the plasma source interlock tool and inline monitoring asset, which facilitate safety and productivity. TEL MARK-V also eliminates non-uniformity of acid etch rates through the Smart PVT (Photo Lithography Temperature) with Plasma-simulated Etch Rate Control. This model adjusts wafer temperatures to changes in temperature and humidity, while also controlling plasma energy level during etching. The Smart PVT is renowned for producing less pattern edge roughness than conventional systems, allowing for higher pattern fidelity. In the areas of time and cost savings, TEL / TOKYO ELECTRON MARK-V is equipped with the Super Speed Step-and-Repeat (SSSR) scanner and the integrated Resist Coater-Developer. Both of these automated mechanisms reduce the time and cost of jobs, such as film processing and mask alignment, respectively. Furthermore, the equipment comes with a highly reliable photomask remover to help minimize manual labor, thereby alleviating the stress of frequent hardware maintenance. In conclusion, MARK-V is a sophisticated photoresist system for high-end IC manufacturing. The unit boasts features that guarantee precision, such as its high-beam quality, Smart PVT, and SSSR and integrated Resist Coater-Developer functions. Through these capabilities, users can benefit from greater machine accuracy and cost savings.