Used TEL / TOKYO ELECTRON Mark V #9033678 for sale

TEL / TOKYO ELECTRON Mark V
ID: 9033678
Coat & Develop track system, 5".
TEL / TOKYO ELECTRON Mark V is a highly advanced photoresist equipment ideal for scientific research and manufacturing. It is a full-featured, self-contained platform designed with state-of-the-art automation, robotics, and vision system capabilities, allowing for fast, accurate, and reliable production in high-tech environments. The unit allows for precision control over photoresist coating, developing, and exposing processes, providing a precise interface layer between physical wafers and circuitry. Additionally, its automated systems reduce the risk of human error, while its broad range of process control parameters provide an ideal platform for rapid optimization of photoresist cycle times and production yields. TEL Mark V utilizes an efficient, highly-integrated automation platform, allowing for the streamlined management and organization of production tasks. The modular robotics machine includes an arm-mounted scanner, flexible positioners, and precise distance sensors, allowing for rapid repositioning and release of silicon wafers without manual intervention. Additionally, the integrated vision tool allows for precise inspection and optoelectronic device calibration in a robust and cost-effective manner. TOKYO ELECTRON MARK-V asset also offers a comprehensive set of coat, develop, and expose recipes. All of the available recipes are programmed for optimal synergy with the other features, allowing for faster, more reliable photoresist processing. Additionally, the model is able to autonomously select recipes based on product-specific requirements, ensuring optimal results regardless of the substrate being processed. TEL MARK-V photoresist equipment offers advanced features that make it an ideal choice for a wide variety of photoresist-related applications. With its flexible automation, robust vision system, and comprehensive recipes, it provides an excellent solution for cost-effective and high-performance photoresist processing.
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