Used TEL / TOKYO ELECTRON Mark V #9033679 for sale

TEL / TOKYO ELECTRON Mark V
ID: 9033679
Coat & Develop track system, 6".
TEL / TOKYO ELECTRON Mark V is a state-of-the-art photoresist equipment for semiconductor production. It is designed to handle a wide range of photoresist materials, including both chemically amplified and non-chemically amplified resist formulations. TEL Mark V system has been optimized to provide superior resolution, superior line edge/width performance, and superior edge placement accuracy. It is also designed to allow for higher throughput per substrate, resulting in greater cost savings. TOKYO ELECTRON MARK-V unit uses TEL Helios FT-IR spectroscopic technology to achieve the highest performance, allowing it to handle a wide range of optics assemblies and substrates. Its low temperature control allows superior etching performance and better uniformity across the entire substrate. The machine also provides an integrated micro-optical traceability tool for optimization of imaging and line edge roughness, as well as for real-time optimization of dose, dose uniformity, and etch rate. The asset is equipped with a wide variety of advanced features, making it ideal for high yield production. It has a high speed multiplexing model for substrate loading and unloading, as well as for patterning and alignment. It also has a modular software package for controlling remaining non-photo-specific parameters such as film thickness and refractive index. Due to its modularity, the equipment allows for the addition of additional capabilities to provide even greater throughput and cost savings. TEL MARK-V system also offers an automated write field alignment unit that allows for higher field accuracy and reduced machine downtime. Its integrated e-Beam/Stepper process control allows exceptional connectivity and optimization between the Stepper and e-Beam tools. The machine also has an integrated e-Beam based overlay and aqueous clean tool for faster, more repeatable etching. TEL / TOKYO ELECTRON MARK-V was designed to support the highest performance photoresist processes. Its robust technology, wide range of features, and excellent connectivity make it an ideal choice for semiconductor manufacturing.
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