Used TEL / TOKYO ELECTRON Mark V #9054827 for sale

TEL / TOKYO ELECTRON Mark V Photoresist Equipment is an advanced, automated coating and developing system specifically designed for lithography reflow and photoresist processing. Photoresist is a light-sensitive material used in lithography to create microscopic patterns on surfaces. The unit is equipped with advanced intelligent process control (IPC) with increased accuracy and complete temperature control for the highest precision. The machine is equipped with an environmental chamber and utilizes a patented self-adjusting flow technology that efficiently and accurately coats substrates with optimal deposition. This ensures a uniform coating and consistent performance over a wide range of temperatures. The tool is also equipped with advanced imaging technology that provides precise recipe-controlled positions and uniform wafers. In addition, a high-capacity coating dual-positioning mechanism facilitates substrate processing while a servo-controlled arm drives the uniformity of the coating. TEL Mark V asset automates the entire photoresist process and incorporates features such as a dynamic heating model and waver thermal control which can be adjusted for various applications. Its high-speed post-deposition equipment increases production throughput, allowing for a greater number of finishes with less stress on the substrates. In addition, the system has an advanced laser scanning unit with the ability to accurately capture lithography patterns and control moveable elements according to the pattern. TOKYO ELECTRON MARK-V photoresist machine has a high-performance cleaning cycle and provides a safe, effective layer of photoresist to a variety of substrates. Its built-in process control features direct and monitor the operations, constantly adjusting and optimizing the parameters to ensure the highest quality results. This ensures more consistent performance, better yields, and ultimately greater overall efficiency. MARK-V tool is designed to maximize process throughput with minimum substrate loss and can be integrated with existing photolithography equipment to provide the highest level of accuracy.