Used TEL / TOKYO ELECTRON Mark V #9226368 for sale

TEL / TOKYO ELECTRON Mark V is a photoresist equipment designed for precision etching and lithographic manufacturing of semiconductor and related products. The system utilizes a combination of light exposure, chemical etching, and post-exposure baking to produce precise mask patterns with high fidelity. The unit uses a 14-layer magazine of Immersion Type Photoresist (ITP) applied to the wafer substrate. Photoresists are transparent organic or inorganic materials which can be exposed to a light source to form a chemically active layer. When an active layer is exposed, the exposed regions become soluble in a developer which can then be selectively removed. The result of this etch process is a pattern in the photoresist which translates to the desired pattern. TEL Mark V has an abnormally large exposure chamber, combined with a high resolution optics machine and high resolution actuation mechanisms, to provide precise exposure of the ITP. These features along with precise magnification and measuring with a 16-bit digital signal processing resolution provides an unmatched lithography tool with a resolution down to 0.68 microns. TOKYO ELECTRON MARK-V has several post-exposure baking functions and processes to ensure a high quality, high fidelity pattern. This includes a post-bake and a multi-step post-bake with the additional capability of controlling the release of chemicals and air cleanliness in the environment for maximum control. A high-resolution measuring module is also available for MARK-V which predicts expected chip size and wavelength from the exposure chamber data. The asset can integrate with a measurement device to obtain highly precise measurements of the finished chip size and data. The photoresist model of Mark V provides the user with an optimal pattern quality while providing maximum efficiency and cost savings. The inventive design, precise etching capabilities, and high fidelity pattern of TOKYO ELECTRON Mark V make it an ideal choice for advanced lithography applications.