Used TEL / TOKYO ELECTRON Mark V #9226369 for sale

TEL / TOKYO ELECTRON Mark V
ID: 9226369
Wafer Size: 6"
Vintage: 1993
Track system, 6" 1993 vintage.
TEL / TOKYO ELECTRON Mark V Photoresist Equipment is a state-of-the-art integration platform designed to facilitate the exposure of high-volume production of photo-sensitive materials for device fabrication. It is the combination of TEL proprietary in-line substrate processing technology and advanced optical capture technology for high-volume production. This system is thus known for its superb uniformity and excellent profile control. TEL Mark V Photoresist Unit incorporates TOKYO ELECTRON advanced vacuum-based mask radiation technology to ensure high alignment accuracy between the mask and the photoresist. With improved exposure operations, this allows for a highly precise alignment between photoresist and the mask pattern. TOKYO ELECTRON MARK-V Photoresist Machine is capable of exposure up to a resolution of 0.25microns, with exposure times as low as 8ms, enabling fine pitch device fabrication. The systems also feature a linear motor embedded optical control tool. This asset utilizes a low distortion actuator to maintain precise alignment between the mask, the wafer and the projection optics. This ensures accurate transfer of the pattern from the mask to the photoresist. In addition, TEL MARK-V Photoresist Model includes a fully automated alignment and exposure equipment that allows for fast and simple maintenance and setup. This system provides for high cross-track uniformity levels, allowing for highly repeatable and consistent results. Furthermore, the unit also employs Dynamic Pattern Tuning (DPT) and Dynamic Focus Control (DFC) technologies to ensure the highest-resolution quality at every exposure. TOKYO ELECTRON Mark V Photoresist Machine also enables low-temperature activation and wet cleaning of the photoresist, as well as minimal risk of damage to the resulting pattern. This tool's development has allowed for lower levels of contamination, enhanced throughput, improved uniformity of products and higher user satisfaction. Overall, MARK-V Photoresist Asset is designed to provide an unparalleled level of performance for consistent and precise fabrication of fine pitch devices. It is the perfect solution for high-volume production of sensitive materials. Furthermore, this model allows for easy maintenance and setup, as well as improved safety and control of the device fabrication process.
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