Used TEL / TOKYO ELECTRON Mark V #9226370 for sale

TEL / TOKYO ELECTRON Mark V
ID: 9226370
Wafer Size: 6"
Vintage: 1990
Track system, 6" 1990 vintage.
TEL / TOKYO ELECTRON Mark V is a superior photoresist and track equipment that offers superior process control and performance. It is designed for high-production etching and development processes, with a range of features and components that enable a high level of operation accuracy. In addition, TEL Mark V ensures that replicating patterns in transferred and developed photoresists is performed accurately and efficiently. The system is equipped with an integrated process control unit that allows for automatic monitoring of key etching parameters. This includes monitoring, autocalibrating, and precisely controlling the etch rate of the photoresist material used. Additionally, this unit can quickly apply uniform layer thickness over a range of points, ensuring that the etching is at optimal levels. TOKYO ELECTRON MARK-V is capable of doing single and multiple layer photoresist processing with long process times. This can save time and cost significantly and avoids process control and production delays. The systems are also capable of repeatable high contrast development, as well as high-precision multiple-layer photolithography. Additionally, the machine can develop very small patterns without any edgeprint or overlapping. Mark V includes a dry-etching unit so etching can be done without the need for wet chemicals. This speeds up the photoresist processing time and is more efficient then using traditional etching methods. The tool also includes an automated inspection asset and image processing to ensure that the etched image is exactly the way it was intended. Furthermore, it can quickly clean and recoat photoresist and track material to prevent any shifting during the etching process. In conclusion, TEL MARK-V is an extremely advantageous photoresist and track model that offers precision process control and repeatable accuracy. Its ability to perform precise etching and development processes accurately and efficiently is ideal for high-production applications. The equipment also offers advanced features such as automated inspection, image processing and dry-etching capability to further streamline the lithography process.
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