Used TEL / TOKYO ELECTRON Mark V #9226374 for sale

TEL / TOKYO ELECTRON Mark V is a photoresist equipment that offers multiple functions for modern semiconductor processing applications. It is designed to accommodate the special requirements of each unique sample being processed, making for more efficient and precise results. The system works by exposing a sample to light which changes the properties of the sample. This enables researchers to precisely pattern photoresist films or other thin layers for subsequent lithography processes or other etching procedures. TEL Mark V is designed with several features that make its use optimized for the application at hand. It is capable of handling and adjusting exposure levels to suit the requirements of a wide variety of samples. It also features multiple filter types and the ability to easily adjust intensities for each filter to ensure the sample's requirements are met. Its high resolution camera has also been specifically designed for improved accuracy. For accurate exposure of the samples, TOKYO ELECTRON MARK-V unit uses a combination of UV and visible light sources. The machine features an auto-focusing feature that adjusts the focus to an optimal level for each sample. With its automated transfer options, it allows for quicker transfer times and improved production speeds. The tool's high level of control helps ensure precise and reliable patterns. It is equipped with the capability for multi-level exposure for both standard or custom levels. This allows for rapid process development and optimization for each specific application. MARK-V asset also offers comprehensive processing capabilities and control over a wide range of substrate materials. It is equipped with the capability to handle specific film thicknesses and resolutions to ensure high-precision patterning. The model also automatically compensates for dispersion from the substrate. Overall, TEL / TOKYO ELECTRON MARK-V is a powerful photoresist equipment designed for efficient and accurate lithography processes. It is capable of automatically handling exposure levels, filter types, focusing, and transfer speeds for improved pattern formation. It offers superior levels of control over substrate materials and film thicknesses which makes for more precise and reliable patterning.