Used TEL / TOKYO ELECTRON Mark V #9226377 for sale

TEL / TOKYO ELECTRON Mark V
ID: 9226377
Wafer Size: 6"
Vintage: 1990
Track system, 6" 1990 vintage.
TEL / TOKYO ELECTRON Mark V is a photoresist equipment designed for advanced nanofabrication and device fabrication. The system is based on a sophisticated scanning configuration in which a single laser is used to transfer a range of patterns onto different substrates. The laser beam is directed through lenses, dichroic mirrors, and other elements that allow a large-area pattern writing and etching with sub-100 nm resolution. The sophisticated scanning unit and precisely calibrated in-situ compensators enable rapid pattern transfer times and high precision. TEL Mark V photoresist machine is equipped with advanced control features to provide ultra-high resolution patterning. Its fast, accurate optical tool with image stabilization technology works in concert with an advanced microprocessor controller to directly drive the stepper motor for the beam position. This control features provides improved velocity and accuracy over conventional systems. TOKYO ELECTRON MARK-V asset offers excellent film selectivity, providing high magnification and superior image quality for submicron feature resolution. The optical model provides high resolution even during the most challenging etching processes. Its variable beam size and power levels enable exacting control of exposure and etching times, allowing complex structures to be created. TOKYO ELECTRON Mark V also includes important advanced features for total equipment control. Its open architecture supports integration with existing systems, providing flexible control of all process parameters. The system includes built-in software tools for simulating etch patterns. It also has the capability to automatically adjust exposure based on changes in scan rate or substrate surface. TEL MARK-V is outfitted with integrated safety features including an enclosed scan chamber, protective film, and nitrogen purge systems. Its automated, easy-to-use operation also makes it suitable for use in low-cost research and development settings. With its advanced features, Mark V provides the flexibility and accuracy required for the production of high-resolution nano-scale features.
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