Used TEL / TOKYO ELECTRON Mark V #9250080 for sale

TEL / TOKYO ELECTRON Mark V
ID: 9250080
Wafer Size: 6"
Vintage: 1997
(2) Coater system, 6" 1997 vintage.
TEL / TOKYO ELECTRON Mark V is an advanced photoresist equipment used for a variety of microfabrication applications. Photoresist is a light-sensitive material that is used in many types of processes, including semiconductor device fabrication, microelectromechanical systems (MEMS), and flat panel display (FPD) production. TEL Mark V facilitates precise coating and patterning of the photoresist materials. This system consists of a CT17 series coating chamber, an advanced patterning unit, and a range of peripherals. The CT17 series features high-precision, high-speed covering, with a maximum uniformity of ±0.2%. This coating chamber can be used for various types of photoresist materials, including dry film photoresist, solutions, and lubricants. It also has an integrated recirculating air curtain that helps achieve a high degree of uniformity and longer exposure times, making it ideal for advanced photolithographic applications. The advanced patterning machine on TOKYO ELECTRON MARK-V features two separate irradiators, each with a maximum exposure power of 10x. This allows for a greater range of exposure angles and higher aspect ratios, essential for modern microfabrication processes. The patterning tool also has a built-in alignment asset to ensure precision placement and alignment of the photoresist on the substrate. Peripherals for TOKYO ELECTRON Mark V include an ultrasonic cleaner, a hotplate spin processor, and an exposure track controller. The ultrasonic cleaner is used to clean photoresist-coated substrates prior to etching or exposure. The hotplate spin processor allows for precisely controlled heating of the substrate, which is essential for uniform coating of the photoresist. The exposure track controller provides stepper or servo driven exposure processes, ensuring accurate movements and maximum throughput. In conclusion, TEL MARK-V provides a reliable and effective photoresist model for microfabrication applications. As a result of its high-precision and high-speed covering and accurate patterning capabilities, this equipment is suitable for a broad range of photolithographic processes. Combined with its range of peripherals, Mark V offers a cost-effective and efficient solution for a variety of microfabrication processes.
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