Used TEL / TOKYO ELECTRON Mark V #9384735 for sale

TEL / TOKYO ELECTRON Mark V
ID: 9384735
Track coater systems.
TEL / TOKYO ELECTRON Mark V Photoresist Equipment is an advanced spin-on photoresist system with features designed to enhance the process of photoresist coating for the semiconductor industry. It features a dual stage coater to achieve uniform deposition of photoresist materials on a wafer surface. The unit can process different resist materials, including thin-film resists such as Hydrogen Silsesquioxane (HSQ) and Benzyl Alcohol Based Resists (BAR) and the spin speed of 3000 rpm up to 16,000 rpm. The machine also come with several options for improved process control. It is equipped with an electronic level monitor to ensure uniform resist coating on the wafer surface at all times. It also features a wafer Tilt Mechanism used to control resist thickness on the edge of the wafer. This tilt mechanism allows a precise control on the edge-exclusion of resist on the wafer to be applied. TEL Mark V Photoresist Tool offers several additional features for precise wafer processing. It is capable of edge bead removal with its built-in edge bead removal nozzle, which enhances the quality of the photoresist in the final photomask. Additionally, its spin-off nozzle is designed for uniform dispersal of photoresist spray around the wafer. In addition, TOKYO ELECTRON MARK-V Photoresist Asset features an after-development wash that uses a high-pressure spray-rinse feature inside the spray chamber. This ensures that photoresists obtained from the model is clean and free of any contaminants. The post-development clean also includes a spin-off nozzle to ensure that any remaining liquid is fully removed. Overall, Mark V Photoresist Equipment's features help significantly reduce the costs associated with photoresist thin film deposition by delivering superior uniformity and improved process control. The system also supports a number of resist materials and provides excellent optical and physical clarity of the finished photomask. This ensures that the resulting lithographic pattern is of superior quality and accuracy.
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