Used TEL / TOKYO ELECTRON Mark Vz 10000WC-N #9148318 for sale

TEL / TOKYO ELECTRON Mark Vz 10000WC-N is a photoresist equipment used for lithography photosensitive applications. It uses an advanced lithography process, in which light is used to transfer a pattern from a photomask onto a substrate. The system enables high quality images, with a precise control of the pattern locations and sizes. The unit is highly integrated, providing a total solution for resists applications including patterning, cleaning, etching, and inspection. It is made up of an illuminator which acts as a light source for the masks, an electron-beam scanner for exposing the masks, and an ion-beam etcher which helps in transferring the pattern onto the substrate. The illuminator has a temperature control of +/- 1°C that ensures a uniform and consistent illumination. The electron-beam scanner is capable of accurately scanning the 1- to 5-micron range and has a maximum operating rate of 500x magnification. It uses a 3-stage acceleration machine, with acceleration/deceleration, focusing, and blanking capabilities. The ion-beam etcher is able to precisely etch samples with a resolution of 2 nanometers. The tool also includes a number of pre- and post-processing systems to meet specific customer requirements. It features image capturing for monitoring and analyzing the processes, auto-alignment calibration, analysis of the acquired data, optically read out of the patterns, and mask inspection. The asset uses TEL ScrubRX solution for cleaning the substrates and a baking selector to accommodate various types of resists. Additionally, it uses a range of scanner-specific electronic filters to control the quality of the image, such as a Multi-Process Filter (MPF), which adjusts image parameters, and ChromaFilters for color separation. Overall, TEL Mark Vz 10000WC-N is an advanced and integrated photoresist model that enables users to achieve quality high-resolution patterns with precise control over pattern locations and sizes. It is suitable for a range of applications, from measuring surface roughness, to the most advanced semiconductor device integration.