Used TEL / TOKYO ELECTRON MARK Vz #149633 for sale

TEL / TOKYO ELECTRON MARK Vz Photoresist Equipment is a high-end precision lithography system for the industrial production of nano- scale patterns. This state-of-the-art lithography unit allows for the production of extremely fine and detailed geometric patterns at frequently used wavelengths (e.g. 633nm, 365nm and 248nm), and provides high-end chemical processing and metrology functions. TEL MARK-VZ Photoresist Machine offers multiple modes of operation, including optical projection lithography (OPL) and electron-beam lithography (EBL). In OPL, light is projected onto a projection lens, and the lens magnifies the fine patterns onto the substrate- the ultimate target of the operation. EBL is the process used when extremely fine structures require extreme precision. This mode of lithography utilizes highly focused electron beam in order to write fine structures onto the substrate. TOKYO ELECTRON MARK V-Z Photoresist Tool also offers various chemical processes, such as prime coating and developing. The prime coating step helps protect the substrate and creates a uniform surface, while the developing helps soften and dissolve the photoresist layer, revealing the underlying pattern. Additionally, TOKYO ELECTRON MARK-VZ Photoresist Asset provides metrology functions to ensure the highest quality of the finished product. These include a variety of measurements, such as line width and height, sidewall angle, and overlay error, which are all important for guaranteeing a precise and consistent pattern geometry. TEL / TOKYO ELECTRON MARK-VZ Photoresist Model is extremely reliable and optimizes both throughput and precision for any lithography process. This equipment allows for the production of exceedingly fine structures, enabling the production of literally any type of pattern imaginable, from 3D structures to nanoelectronic devices. This system thus stands as an invaluable tool for companies looking to manufacture the finest and most intricate structures.