Used TEL / TOKYO ELECTRON MARK Vz #293625671 for sale

TEL / TOKYO ELECTRON MARK Vz is a photoresist equipment that is used for lithographic processes. It is designed to expertly process and handle the wide range of photoresist materials that are used in the photolithographic process. It combines several technologies to make it capable of producing the highest quality results. The system is designed to provide improved resolution and accuracy over other systems due to its advanced optical unit. The machine is also designed with a high-speed, three-dimensional structure and scanning mechanism that allows for faster imaging and processing. The optics provide a uniform, bright light source which ensures uniform exposure of the photoresist. The tool is designed to be able to process a variety of photoresists, including polymethylmethacrylate (PMMA), polyimide (PI), polymethylpentene (PMP), polyvinylphenol (PVP), polystyrene (PS), and polyacrylonitrile (PAN) polymers. It is also capable of processing a wide range of materials from various substrates, such as copper, aluminum, iron, tin, glass, plastic, and paper. TEL MARK-VZ asset is designed for use with a wide variety of photomasks, allowing for a wider range of photo-exposure and patterning applications. The photomasks are specifically designed to reduce and limit surface reflections, thus providing better definition and detail. Additionally, the model can handle multiple layers of photomasks, allowing for deeper patterning applications. The equipment is designed with a fully automated system, allowing for a reliable, consistent, and repeatable output quality. The automated unit is programmed to meet the exact photolithographic process requirements. TOKYO ELECTRON MARK V-Z photoresist machine is designed to provide the highest levels of accuracy and reliability to ensure the best results for any photolithographic process. With advanced optics, automated systems, and the capability of processing a wide range of materials, this tool is an ideal choice for any type of lithography application.