Used TEL / TOKYO ELECTRON MARK Vz #293828918 for sale

TEL / TOKYO ELECTRON MARK Vz is a photoresist equipment used in semiconductor device fabrication for electron beam lithography and etching. The system consists of a vacuum chamber, shutter, ion gun, and optical microscope. The vacuum chamber is designed to maintain a high vacuum environment. A shutter is used to disperse the beam from the electron gun, which can be fine-tuned for resolution of 10 nm or better. An ion gun is also included as a chamber cleaning unit. An optical microscope is used to image the sample and monitor the beam spot size and shape. TEL MARK-VZ enables high resolution direct writing of submicron features with resolution better than 10 nm. It provides a complete photoresist patterning toolkit to create complex pattern shapes with multiple layers of features. The patterning features can be aligned with accuracy of 1 µm. By using a multi-channel alignment machine, multiple patterns can be aligned to match each other with high accuracy. TOKYO ELECTRON MARK V-Z also enables high speed electron lithography with a fast scan speed and short RF pulse time. The tool can be used in various applications, such as for creation of optical masks, thin film transistors, MEMS devices, and integrated circuits. In particular, it offers high resolution and high speed pattern writing for MEMS devices. The asset is highly customizable and can be used for multiple applications and materials. TOKYO ELECTRON MARK Vz is a reliable and efficient photoresist model for device fabrication. It is designed for high throughput and high resolution patterning. The equipment offers advanced features to securely and accurately create complex micro- and nanoscale features. It is highly customizable and suitable for a wide range of device fabrication applications.