Used TEL / TOKYO ELECTRON MARK Vz #9111395 for sale

TEL / TOKYO ELECTRON MARK Vz is a photoresist processing equipment designed to efficiently etch, image, and clean surfaces. It provides a complete solution for photoresist processing with state-of-the-art components, processes, and software. The system features a two-in-one atmosphere control, which ensures consistency and accuracy with combined vacuum and nitrogen gas control for optimal imaging, etching, and deposition process results. Photoresist is a special material used to pattern integrated circuits. It's used in the semiconductor industry to apply a precise pattern on a silicon substrate. The unit is made up of several components, including a process chamber and showerhead assembly, reactor with head-discharge unit, nanolaminate cassettes, process gas control, and software. The systems additionally offers both HF and HCl wet etching for photoresist patterning, etching, and cleaning processes. The HF etching process removes the photoresist from the silicon substrate and also cleans the substrate to prepare it for subsequent steps. HCl etching is used for a shallow etch, allowing precise depth control. The photoresist cassette machine has the capability to offer variable thicknesses, and can be used to etch from shallow to deep including pre-etching and post-etching. It also features a unique passivation which improves thermal dispersion performance when coating the substrate. The tool's process gases are regulated to ensure optimal imaging performance, etching and deposition processes, and substrate protection. The asset features a variety of user-friendly process control software, such as a Process Control Unit with a graphical user interface, and a Process Chamber Safety Monitor to ensure a safe working environment. The model also allows for recipe editing from a remote terminal. These features enable quick and accurate process parameter setting for consistent and accurate results. TEL MARK-VZ photoresist processing equipment maximizes accuracy and greatly reduces cycle time for photoresist processing tasks. Its combination of efficient components, processes, and software makes it an ideal solution for surface imaging, etching, and cleaning applications.