Used TEL / TOKYO ELECTRON MARK Vz #9118822 for sale

TEL / TOKYO ELECTRON MARK Vz is an advanced photoresist equipment designed for advanced multilayer submicron device fabrication. It consists of a photomask aligner, a spinner, a dry etcher, a wet developer, and a plasma asher. The system is capable of depositing up to four multilayer layers of submicron device precursors with an extremely precise level of accuracy through the use of its automated alignment unit, and its highly configurable, multi-layer resist process. TEL MARK-VZ mask aligner is capable of masking both positive and negative resists at resolutions down to 0.15 μm, making it ideal for submicron device fabrication. The spinner is also highly precise and features a temperature controlled environment, allowing fine-tuned control of the photoresist evaporation rate and thickness. With the assist of the ALD/PEALD and DVD systems, a highly uniform and high-quality resist film can be obtained. The dry etcher is also an essential component of the machine, allowing for the precise deposition of dopants and other components on substrates prior to photoresist patterning. The wet developer utilizes the wet chemical processing tool to guarantee reliable resist development that can achieve uniform resist lift-off and removal. Finally, the plasma asher ensures fine-tuned etching by eliminating the underetch or overetch issues that can crop up with traditional dry etching. TOKYO ELECTRON MARK V-Z offers advanced device fabrication and an array of customizability to meet the specific requirements of its customers. It's a reliable and highly precise photoresist asset designed for the most demanding applications, with its automated and highly configurable resist processes and alignment systems. The model also offers faster execution times and cycle times as well as cost-efficient processing, allowing customers to make their devices reliable, quickly, and with less waste.