Used TEL / TOKYO ELECTRON MARK Vz #9142614 for sale

TEL / TOKYO ELECTRON MARK Vz is a state-of-the-art photoresist equipment designed for various applications, such as: photolithography, thin film deposition, and planarization. As an updated version of the MARK.V, this photoresist system reflects the combination of sophisticated process engineering techniques based on TEL expertise and many years of hard experience. At the heart of the machine is a sophisticated controller that is capable of managing up to eight processing modules simultaneously, allowing for multiple process recipes to be employed in one run. It employs real-time, three-dimensional topography processing and monitoring, with a DOS-based off-line programmer, allowing users to easily program, monitor, and adjust the processing parameters. TEL MARK-VZ is equipped with an advanced 7-axis robot arm unit that is capable of performing precise dispense motion, while providing reliable automation during the most demanding overcoat and photoresist processes. Furthermore, it offers a dynamic range of motion control parameters, empowering users to accurately program the robot's movements for each specific process. The machine also uses a dual-beam electron beam lithography (EBL) source (which operates at 50 KeV) to ensure precise patterning resolution and high accuracy, and to effectively address challenges of small critical dimensions and finer line widths on wafers. TOKYO ELECTRON MARK V-Z is also equipped with an ion source for implantation processes, providing optimum end-point measurements and tight conformal uniformity of the material layer. Finally, the highly accurate optical measurement and process monitoring features deliver superior defect and production yield rates. The tool's advanced multi-sensor metrology asset uses both optical and electrical measurements to measure critical characteristics such as film thickness, resist thickness, pattern size, step height, and surface uniformity. The integrated non-contact four-wavelength ellipsometric metrology (EM) model also enables efficient in-process characterization and validation of topographical changes. In summary, TOKYO ELECTRON MARK Vz offers a powerful, automated and accurate photoresist equipment for R&D and production applications. With the right skills and experience, this system can ensure reliable and precise results in a wide variety of processes, ultimately leading to improved product yields.